发明名称 MULTICHANNEL DEVICES WITH GATE STRUCTURES TO INCREASE BREAKDOWN VOLTAGE
摘要 A transistor device is provided that includes a base structure and a superlattice structure that overlies the base structure. The superlattice structure comprises a multichannel ridge having sides that extend to the base structure. The multichannel ridge comprises a plurality of heterostructures that each form a channel of the multichannel ridge. A three-sided gate configuration is provided that wraps around and substantially surrounds the top and sides of the multichannel ridge along at least a portion of its depth. The three-sided gate configuration is configured to re-distribute peak electric fields along the three-sided gate configuration to facilitate the increase in breakdown voltage of the transistor device.
申请公布号 US2016293713(A1) 申请公布日期 2016.10.06
申请号 US201514676285 申请日期 2015.04.01
申请人 NECHAY BETTINA A.;Howell Robert S.;Stewart Eric J.;Henry Howell George;Parke Justin Andrew;Freitag Ronald G. 发明人 NECHAY BETTINA A.;Howell Robert S.;Stewart Eric J.;Henry Howell George;Parke Justin Andrew;Freitag Ronald G.
分类号 H01L29/40;H01L29/78;H01L29/778;H01L29/205;H01L29/10;H01L29/423;H01L29/15;H01L29/20 主分类号 H01L29/40
代理机构 代理人
主权项 1. A transistor device comprising: a base structure; a superlattice structure overlying the base structure and comprising a multichannel ridge having sides that extend to the base structure, the multichannel ridge comprising a plurality of heterostructures that each form a channel of the multichannel ridge; and a three-sided gate configuration that wraps around and substantially surrounds the top and sides of the multichannel ridge along at least a portion of its depth, the three-sided gate configuration is configured to re-distribute peak electric fields along the three-sided gate configuration to facilitate the increase in breakdown voltage of the transistor device.
地址 Laurei MD US