发明名称 PHOTOSENSITIVE TRANSFER MATERIAL, PATTERN FORMATION METHOD, AND ETCHING METHOD
摘要 PROBLEM TO BE SOLVED: To provide a photosensitive transfer material that is positive, and has good transferability and excellent heat-resistant rectangularity.SOLUTION: The photosensitive transfer material has a support, a thermoplastic resin layer, and a photosensitive resin composition layer in this order, the photosensitive resin composition layer including: a polymer component (A) including a polymer having a constituent unit (a1), having a group in which an acid group is protected by an acid dissociable group; and a photoacid generator (B).
申请公布号 JP2014085643(A) 申请公布日期 2014.05.12
申请号 JP20120237163 申请日期 2012.10.26
申请人 FUJIFILM CORP 发明人 ITO HIDEAKI;FUJIMOTO SHINJI;KAWABE YASUMASA
分类号 G03F7/004;C08F212/14;G03F7/039;G03F7/40;G03F7/42;H01L51/50;H05B33/22 主分类号 G03F7/004
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