发明名称 Substrate alignment apparatus and method, and exposure apparatus
摘要 A substrate alignment apparatus which aligns and fixes a substrate on a substrate stage includes a chucking pad fixed on the substrate stage to chuck and fix the substrate, a moving unit which moves the substrate with respect to the substrate stage such that a mark on the substrate stage and a mark on the substrate coincide with each other, and a determination unit which manages a relative position between the chucking pad and the substrate after movement by the moving unit and determines whether the chucking pad can normally chuck the substrate.
申请公布号 US2004184036(A1) 申请公布日期 2004.09.23
申请号 US20040765390 申请日期 2004.01.28
申请人 CANON KABUSHIKI KAISHA 发明人 KUSUMOTO HIROSHI
分类号 G03F9/00;G01B11/27;G03F7/20;H01L21/027;H01L21/68;H01L21/683;(IPC1-7):G01B11/00;H01L21/00 主分类号 G03F9/00
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