| 摘要 |
A charged particle application circuit pattern inspection apparatus and method are disclosed, in which the reduction in the rejection rate attributable to an out-of-focus state due to the change in the charge condition on the sample surface is prevented and the false information is reduced to improve the apparatus reliability. The image acquisition position on a sample is stored in an image acquisition position storage unit, a focus correction value is stored in a focus correction value storage unit in accordance with the image acquisition position and the sample charge condition, the inspection conditions and the sample to be inspected are input from an input unit, the sample charge condition is evaluated in accordance with the image position acquisition position, and the focal point is corrected by a focus correction unit.
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