COATING SOLUTION FOR FORMING TRANSPARENT DIELECTRIC THIN FILM FOR LOW-TEMPERATURE PROCESS AND TRANSPARENT INORGANIC THIN FILM TRANSISTOR HAVING THE THIN FILM FORMED BY THE COATING SOLUTION

摘要

Provided is a coating solution for forming a transparent dielectric thin film. The coating solution comprises: a first material including aluminum; a second material including zirconium; and a solvent which dissolves the first and second materials. The solvent includes first and second solvents.