| 摘要 |
A pattern inspection apparatus includes: an inspection threshold setting unit to set a defect detection threshold to be used in inspection of an inspection pattern by referring to design information of an inspection layer which is included in a plurality of layers on a substrate and which has the inspection pattern formed thereon, and design information of an adjacent layer which is one of two layers adjacent to the inspection layer in a normal line direction of the substrate; a deviation amount calculation unit to receive an image containing the inspection layer and the adjacent layer, detect edges of the image, and calculate a deviation amount between an edge of the inspection pattern and an edge of a pattern of the adjacent layer; and a defect determination unit to determine whether there is a defect in the inspection pattern by comparing the calculated deviation amount with the defect detection threshold.
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