REFLECTIVE MASK AND PROCESS OF MANUFACTURING THE SAME

摘要

PROBLEM TO BE SOLVED: To provide a reflective mask capable of suppressing a size change accompanying a focus change.SOLUTION: A reflective mask 10 includes: a substrate 11; a multilayer reflection film 12 formed on the substrate 11; an absorption pattern 21A formed on the multilayer reflection film 12; and a recess 13 formed on the multilayer reflection film 12 in a peripheral area of the absorption pattern 21A.