| 摘要 |
PROBLEM TO BE SOLVED: To provide a radiation-sensitive composition for forming a cured film, which can enhance pattern resolution, suppress generation of a development residue and increase heat-resistant transparency and light fastness, a cured film obtained from the radiation-sensitive composition for forming a cured film, a display element using the cured film, and a method for forming the cured film.SOLUTION: The radiation-sensitive composition for forming a cured film, comprises: a polysiloxane having a first structural unit including a first group represented by formula (1), a second structural unit including a second group represented by formula (2), or a combination of these units; and a photosensitive agent. In formula (1), Rand Rrepresent a hydrogen atom, an alkyl group having 1 to 4 carbon atoms, or a fluorinated alkyl group having 1 to 4 carbon atoms; and Xrepresents a hydrogen atom or a monovalent organic group having 1 to 20 carbon atoms. In formula (2), Xrepresents a hydrogen atom or a monovalent organic group having 1 to 20 carbon atoms.SELECTED DRAWING: None |
