发明名称 PHOTOSENSITIVE RESIN COMPOSITION, DRY FILM AND CURED PRODUCT OF THE SAME, ELECTRONIC COMPONENT OR OPTICAL PRODUCT CONTAINING CURED PRODUCT, AND ADHESIVE COMPRISING PHOTOSENSITIVE RESIN COMPOSITION
摘要 PROBLEM TO BE SOLVED: To provide a photosensitive resin composition that gives a large contrast in a development rate (dissolution contrast) between an exposed part and an unexposed part by irradiation with active rays and allows easy formation of a pattern with high accuracy.SOLUTION: The photosensitive resin composition comprises: (A) a polymer precursor having at least one type of repeating unit of a polyamic acid and a polyamic acid ester obtained from an amine component and an acid anhydride component having an aliphatic skeleton and an aromatic skeleton; and (B) photo-reactive latent basic substance that generates a base by irradiation with active rays.SELECTED DRAWING: None
申请公布号 JP2016130836(A) 申请公布日期 2016.07.21
申请号 JP20150193095 申请日期 2015.09.30
申请人 TAIYO HOLDINGS CO LTD 发明人 GUO YANGMEI;MIWA TAKAO
分类号 G03F7/038;C08G73/10;G03F7/004;G03F7/20;G03F7/38 主分类号 G03F7/038
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