发明名称 |
PHOTOSENSITIVE RESIN COMPOSITION, DRY FILM AND CURED PRODUCT OF THE SAME, ELECTRONIC COMPONENT OR OPTICAL PRODUCT CONTAINING CURED PRODUCT, AND ADHESIVE COMPRISING PHOTOSENSITIVE RESIN COMPOSITION |
摘要 |
PROBLEM TO BE SOLVED: To provide a photosensitive resin composition that gives a large contrast in a development rate (dissolution contrast) between an exposed part and an unexposed part by irradiation with active rays and allows easy formation of a pattern with high accuracy.SOLUTION: The photosensitive resin composition comprises: (A) a polymer precursor having at least one type of repeating unit of a polyamic acid and a polyamic acid ester obtained from an amine component and an acid anhydride component having an aliphatic skeleton and an aromatic skeleton; and (B) photo-reactive latent basic substance that generates a base by irradiation with active rays.SELECTED DRAWING: None |
申请公布号 |
JP2016130836(A) |
申请公布日期 |
2016.07.21 |
申请号 |
JP20150193095 |
申请日期 |
2015.09.30 |
申请人 |
TAIYO HOLDINGS CO LTD |
发明人 |
GUO YANGMEI;MIWA TAKAO |
分类号 |
G03F7/038;C08G73/10;G03F7/004;G03F7/20;G03F7/38 |
主分类号 |
G03F7/038 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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