| 摘要 |
The present invention relates to a method for adjusting the magnification scale of an optical imaging device for exposing or inspecting substrates, in particular at a wavelength of less than 200 nm, comprising a first optical element group (110), which comprises a plurality of first optical elements (110.1, 110.2), which are arranged in an imaging beam path. Herein, the optical elements (110.1, 110.2) of the first optical element group (110) will be replaced in the imaging beam path by optical elements (113.1, 113.2) of a second optical element group (113) for the purposes of adjusting the magnification scale. The first optical element group (110) comprises two reflecting optical elements (110.1, 110.2) with first optical parameters, which define a first Petzval sum, while the second optical element group (113) comprises two reflecting optical elements (113.1, 113.2) with second optical parameters, which define a second Petzval sum, wherein the value of the first Petzval sum is at least substantially identical to the value of the second Petzval sum. |
