发明名称 |
Method, system, and program product for interactive checking for double pattern lithography violations |
摘要 |
Disclosed are a method, apparatus, and computer program product for performing interactive layout editing to address double patterning approaches to implement lithography of electronic designs. A spatial query is performed around the shape(s) being created during editing with the distance of allowed spacing in a single mask. If a design error is encountered, corrective editing may occur to correct the error. Checking may occur to make sure that the error detection and corrective actions can be performed interactively. |
申请公布号 |
US8739095(B2) |
申请公布日期 |
2014.05.27 |
申请号 |
US20100719710 |
申请日期 |
2010.03.08 |
申请人 |
CAO MIN;RUEHL ROLAND;CADENCE DESIGN SYSTEMS, INC. |
发明人 |
CAO MIN;RUEHL ROLAND |
分类号 |
G06F9/455;G06F17/50 |
主分类号 |
G06F9/455 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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