发明名称 RADIATION-SENSITIVE COMPOSITIONS AND ELEMENTS WITH SOLVENT RESISTANT POLY(VINYL ACETAL)S
摘要 <p>A radiation-sensitive composition can be used to prepare positive-working imageable elements having improved solvent resistance and is useful for making lithographic printing plates. The composition includes an alkaline soluble polymeric binder that is a specific poly(vinyl acetal) that exhibits improved resistance to press chemicals, and a radiation absorbing compound.</p>
申请公布号 WO2009005582(A1) 申请公布日期 2009.01.08
申请号 WO2008US07389 申请日期 2008.06.13
申请人 EASTMAN KODAK COMPANY;LEVANON, MOSHE;LURIE, EMMANUEL;KAMPEL, VLADIMIR 发明人 LEVANON, MOSHE;LURIE, EMMANUEL;KAMPEL, VLADIMIR
分类号 G03F7/033;B41C1/10;B41M5/36 主分类号 G03F7/033
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