发明名称 |
Method for producing a solar cell, in particular a silicon thin-film solar cell |
摘要 |
The invention relates to a method for producing a solar cell, in particular a silicon thin-film solar cell wherein a TCO layer (3) is applied to a glass substrate (1) and at least one silicon layer (4, 5) is applied to the TCO layer (3). Before the TCO layer (3) is applied, electron radiation is applied to the glass substrate (1), such that a light-scattering layer (2) of the glass substrate (1) is produced, to which light-scattering layer the TCO layer (3) is applied. Alternatively or additionally, according to the invention, a first silicon layer (4) can be applied to the TCO layer (3), a laser radiation or electron radiation can be applied to the first silicon layer (4), and a second silicon layer (5) can be applied to the irradiated first silicon layer (4). |
申请公布号 |
US2016172529(A1) |
申请公布日期 |
2016.06.16 |
申请号 |
US201414902779 |
申请日期 |
2014.07.23 |
申请人 |
LILAS GMBH |
发明人 |
LISSOTSCHENKO Vitalij |
分类号 |
H01L31/18;H01L31/0236 |
主分类号 |
H01L31/18 |
代理机构 |
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代理人 |
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主权项 |
1. A method for producing a solar cell, in particular a silicon thin-film solar cell, comprising the following method steps:
depositing a TCO layer (3) on a glass substrate (1); depositing at least a silicon layer (4, 5) on the TCO layer (3):wherein prior to the application of the TCO layer (3), the glass substrate (1) is exposed to electron radiation, so that a light-scattering layer (2) of the glass substrate (1) is formed, on which the TCO layer (3) is deposited. |
地址 |
Dortmund DE |