发明名称 METHOD AND APPARATUS FOR POWER DEVICE WITH MULTIPLE DOPED REGIONS
摘要 A semiconductor device is provided. The device includes a substrate having a first conductivity type. The device further includes a drain region, a source region, and a well region disposed in the substrate. The well region is disposed between the drain region and the source region and having a second conductivity type opposite to the first conductivity type. The device further includes a plurality of doped regions disposed within the well region. The doped regions are vertically and horizontally offset from each other. Each of the doped regions includes a lower portion having the first conductivity type, and an upper portion stacked on the lower region and having the second conductivity type.
申请公布号 US2016172487(A1) 申请公布日期 2016.06.16
申请号 US201615052624 申请日期 2016.02.24
申请人 Vanguard International Semiconductor Corporation 发明人 TU Shang-Hui;HUANG Chih-Jen;CHANG Jui-Chun;LIN Shin-Cheng;HO Yu-Hao;LIN Wen-Hsin
分类号 H01L29/78;H01L29/08;H01L29/06;H01L29/10 主分类号 H01L29/78
代理机构 代理人
主权项
地址 Hsinchu TW