发明名称 MANUFACTURING METHOD OF SEMICONDUCTOR DEVICE, SEMICONDUCTOR DEVICE, CIRCUIT SUBSTRATE AND ELECTRONIC EQUIPMENT
摘要 A method of manufacturing a semiconductor device is provided. The method includes embedding and forming a coupling terminal as an external electrode of an electronic circuit on an active surface side of a substrate having an active surface formed with a plurality of electronic circuits, exposing a part of the coupling terminal by polishing a back surface side of the substrate, mounting a semiconductor chip on the back surface side of the substrate via the coupling terminal, sealing the semiconductor chip mounted on the substrate by a sealing material, and cutting the substrate for every forming area of each electronic circuit and dividing it into a plurality of semiconductor devices.
申请公布号 KR20050061357(A) 申请公布日期 2005.06.22
申请号 KR20040106835 申请日期 2004.12.16
申请人 SEIKO EPSON CORPORATION 发明人 FUKAZAWA MOTOHIKO
分类号 H01L21/66;H01L21/301;H01L21/3205;H01L21/768;H01L23/12;H01L23/48;H01L23/52;H01L25/00;H01L25/065;H01L25/07;H01L25/18 主分类号 H01L21/66
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