SEMICONDUCTOR APPARATUS INCLUDING PROCESS CHAMBER UNIT WITH A BLOCK JACKET THEREIN

摘要

A semiconductor apparatus having a process chamber unit with a block jacket therein is provided to minimize cleaning time of a process chamber and to improve productivity by using the block jacket capable of being separated from an inner wall of the process chamber unit. A process chamber(100) is used in a semiconductor process as an atomic layer deposition. A susceptor is installed in the process chamber to receive a wafer on an upper portion thereof. The susceptor is protruded from a bottom of the process chamber. A heater is provided at a lower of the susceptor to heat the wafer received on the upper portion thereof at constant temperature. An entrance(130) is provided on a side of the process chamber. A vacuum unit(120) for making a vacuum state is provided in the process chamber. A block jacket(200) covers a portion of an inner wall of the process chamber and is capable of being separated from the inner wall. The block jacket covers a bottom of the process chamber adjacent to the susceptor. The block jacket covers a sidewall of the process chamber.