| 发明名称 |
Methods for Selective Placement of Dislocation Arrays |
| 摘要 |
Misfit dislocations are selectively placed in layers formed over substrates. Thicknesses of layers may be used to define distances between misfit dislocations and surfaces of layers formed over substrates, as well as placement of misfit dislocations and dislocation arrays with respect to devices subsequently formed on the layers.
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| 申请公布号 |
US2008070397(A1) |
申请公布日期 |
2008.03.20 |
| 申请号 |
US20070945130 |
申请日期 |
2007.11.26 |
| 申请人 |
AMBERWAVE SYSTEMS CORPORATION |
发明人 |
LOCHTEFELD ANTHONY J.;LEITZ CHRISTOPHER W.;CURRIE MATTHEW T.;BULSARA MAYANK |
| 分类号 |
H01L21/44;C30B25/18;H01L21/20;H01L21/336;H01L21/762;H01L21/8238;H01L29/10;H01L29/78 |
主分类号 |
H01L21/44 |
| 代理机构 |
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代理人 |
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| 主权项 |
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