发明名称 SEMICONDUCTOR DEVICE AND METHOD OF MANUFACTURING THE SAME
摘要 A semiconductor device includes a semiconductor layer formed on a substrate, an electrode contact window that includes a recess formed on a surface of the semiconductor layer, an inner wall having a slope, and a source electrode, a drain electrode, and a gate electrode formed on the semiconductor layer, in which the drain electrode is in contact with the slope of the inner wall.
申请公布号 US2016260818(A1) 申请公布日期 2016.09.08
申请号 US201615074014 申请日期 2016.03.18
申请人 Sumitomo Electric Device Innovations, Inc. 发明人 Nishi Masahiro
分类号 H01L29/66;H01L21/308;H01L29/778;H01L29/20;H01L29/417 主分类号 H01L29/66
代理机构 代理人
主权项
地址 Yokohama-shi JP