METHOD FOR FORMING RESIST PATTERN AND LAMINATE STRUCTURE

摘要

PROBLEM TO BE SOLVED: To allow a resist film to follow the shape of a recessed portion of a substrate.SOLUTION: A method for forming a resist pattern includes the steps of: preparing a substrate having a recessed portion: in disposing a photosensitive resist film on a substrate under a first atmosphere, covering an opening of the recessed portion with the resist film to form a cavity part; under a second atmosphere higher than the first atmosphere, heating the resist film; bringing the resist film into contact with an inner wall of the recessed portion; exposing the resist film; developing the resist film; and opening the resist film located at the recessed portion.