| 摘要 |
An exposure apparatus and an image plane detecting method are provided to measure a location for an image plane of a projection optical system accurately by using a light source of multiple wavelengths. An exposure apparatus includes an illumination optical system(IL) for irradiating an original plate(RS) with exposure light of multiple wavelength from a light source; a projection optical system(PO) for projecting the pattern image of the original plate onto the substrate(WS); an original plate-sided reference pattern; a substrate-sided reference pattern; and an image plane detecting unit for irradiating the original plate-sided reference pattern by light equivalent to the exposure light and projecting an image of the original plate-sided reference pattern on the substrate-sided reference pattern by the projection optical system to detect a location of the image plane of the projection optical system on the basis of an amount of light transmitted through or reflected by the substrate-sided reference pattern, wherein the original plate-sided reference pattern and the substrate-sided reference pattern used when the image plane detecting unit detects the location at an off-axial height of the projection optical system, include a plurality of silts arranged in a sagittal direction of the projection optical system.
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