发明名称 |
Vapor deposition of benzotriazole (BTA) for protecting copper interconnects |
摘要 |
A method of protecting an interconnect is provided. The method includes forming an integrated circuit structure having an interconnect, and depositing vaporized benzotriazole on the interconnect.
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申请公布号 |
US2008047490(A1) |
申请公布日期 |
2008.02.28 |
申请号 |
US20070901180 |
申请日期 |
2007.09.17 |
申请人 |
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发明人 |
XIA CHANGFENG F.;SIVASOTHY ARUNTHATHI;JACKSON RICKY A.;HAIDER ASAD M. |
分类号 |
C23C16/00 |
主分类号 |
C23C16/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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