发明名称 PHOTO-PATTERNABLE GATE DIELECTRICS FOR OFET
摘要 Articles utilizing polymeric dielectric materials for gate dielectrics and insulator materials are provided along with methods for making the articles. The articles are useful in electronics-based devices that utilize organic thin film transistors.
申请公布号 US2016268525(A1) 申请公布日期 2016.09.15
申请号 US201615066548 申请日期 2016.03.10
申请人 CORNING INCORPORATED 发明人 Bellman Robert Alan;He Mingqian;Myers Timothy Edward;Niu Weijun;Schissel David Neal;Simonton Kristi Lynn;Wallace Arthur Lawrence
分类号 H01L51/05;H01L51/10 主分类号 H01L51/05
代理机构 代理人
主权项 1. An article comprising: a. a substrate having a first surface and a second surface; b. an organic semiconductor layer; c. a gate, a source, and a drain electrode; and d. a dielectric layer; wherein the dielectric layer comprises a polymer:wherein A is an epoxide-containing monomer; B is second monomer; n is an integer of one or greater; m is an integer of one or greater; the ratio of n:m is from about 20:1 to about 1:20; and each R1 and R2 are independently, hydrogen, substituted or unsubstituted alkyl, substituted or unsubstituted aryl or heteroaryl, substituted or unsubstituted cycloalkyl, substituted or unsubstituted aralkyl, ester, alkoxy, thiol, thioalkyl, or halide; and Linker is a substituted or unsubstituted alkyl, substituted or unsubstituted aryl or heteroaryl, substituted or unsubstituted cycloalkyl, aralkyl, ester, ether, alkoxy, alkylthio, or thioalkyl.
地址 CORNING NY US