发明名称 |
ELECTRON BEAM MASKS FOR COMPRESSIVE SENSORS |
摘要 |
Transmission microscopy imaging systems include a mask and/or other modulator situated to encode image beams, e.g., by deflecting the image beam with respect to the mask and/or sensor. The beam is modulated/masked either before or after transmission through a sample to induce a spatially and/or temporally encoded signal by modifying any of the beam/image components including the phase/coherence, intensity, or position of the beam at the sensor. For example, a mask can be placed/translated through the beam so that several masked beams are received by a sensor during a single sensor integration time. Images associated with multiple mask displacements are then used to reconstruct a video sequence using a compressive sensing method. Another example of masked modulation involves a mechanism for phase-retrieval, whereby the beam is modulated by a set of different masks in the image plane and each masked image is recorded in the diffraction plane. |
申请公布号 |
WO2016149676(A1) |
申请公布日期 |
2016.09.22 |
申请号 |
WO2016US23286 |
申请日期 |
2016.03.18 |
申请人 |
BATTELLE MEMORIAL INSTITUTE |
发明人 |
STEVENS, Andrew, J.;KOVARIK, Libor;BROWNING, Nigel, D.;LIYU, Andrey, V. |
分类号 |
G21K5/10;G21K5/00;H01J37/08 |
主分类号 |
G21K5/10 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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