发明名称 ELECTRON BEAM MASKS FOR COMPRESSIVE SENSORS
摘要 Transmission microscopy imaging systems include a mask and/or other modulator situated to encode image beams, e.g., by deflecting the image beam with respect to the mask and/or sensor. The beam is modulated/masked either before or after transmission through a sample to induce a spatially and/or temporally encoded signal by modifying any of the beam/image components including the phase/coherence, intensity, or position of the beam at the sensor. For example, a mask can be placed/translated through the beam so that several masked beams are received by a sensor during a single sensor integration time. Images associated with multiple mask displacements are then used to reconstruct a video sequence using a compressive sensing method. Another example of masked modulation involves a mechanism for phase-retrieval, whereby the beam is modulated by a set of different masks in the image plane and each masked image is recorded in the diffraction plane.
申请公布号 WO2016149676(A1) 申请公布日期 2016.09.22
申请号 WO2016US23286 申请日期 2016.03.18
申请人 BATTELLE MEMORIAL INSTITUTE 发明人 STEVENS, Andrew, J.;KOVARIK, Libor;BROWNING, Nigel, D.;LIYU, Andrey, V.
分类号 G21K5/10;G21K5/00;H01J37/08 主分类号 G21K5/10
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