发明名称 |
PHOTOIMAGEABLE, THERMOSETTABLE FLUORINATED RESISTS |
摘要 |
The present invention provides fluorinated, thermosettable compositions that are photoimageable and which function as low dielectric materials. Such low dielectric materials are useful as passivation resist layers in liquid crystal displays, electroluminescent displays, light emitting diodes and semiconductor manufacture. |
申请公布号 |
WO2006099380(A3) |
申请公布日期 |
2007.12.13 |
申请号 |
WO2006US09050 |
申请日期 |
2006.03.11 |
申请人 |
E.I. DUPONT DE NEMOURS AND COMPANY;KIM, YOUNG, H. |
发明人 |
KIM, YOUNG, H. |
分类号 |
G03F7/004;C08F214/18;C08F214/26;C08F232/08;G03F7/00;G03F7/038;G03F7/039;G03F7/095 |
主分类号 |
G03F7/004 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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