| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a photo mask height measuring method for detecting a height measurement position under drawing conditions, and to provide an electron beam drawing device for height measurement. <P>SOLUTION: The height measuring method is provided which comprises forming patterns different in light reflectivity on a calibration mark, scanning the patterns with light, specifying the position of a measurement point for height measurement, corresponding to detected light quantity data, specifying the position of the measurement point for scanning and height measurement under drawing conditions, comparing the positions of the measurement point corresponding to predetermined light quantity data before and after the drawing conditions, with each other, detecting a displacement under the drawing conditions, and generating correction data for the position of the measurement point for height measurement under the drawing conditions, from the displacement. The electron beam drawing device is also provided. <P>COPYRIGHT: (C)2009,JPO&INPIT |
