| 发明名称 |
Method for removing sulphur, nitrogen and halogen impurities from a synthetic gas |
| 摘要 |
The invention relates to a method for the ultimate removal of sulphur, nitrogen and halogen impurities from a synthetic gas, wherein said method includes: a) the combined step of hydrolysing COS and HCN contained in the gas and trapping the halogen compounds using a TiO |
| 申请公布号 |
AU2009336619(B2) |
申请公布日期 |
2016.07.14 |
| 申请号 |
AU20090336619 |
申请日期 |
2009.12.03 |
| 申请人 |
IFP ENERGIES NOUVELLES |
发明人 |
CHICHE, DAVID;BOUDET, NICOLAS;VIGUIE, JEAN-CHRISTOPHE;LELIAS, MARC-ANTOINE;DUCREUX, OLIVIER |
| 分类号 |
B01D53/52;B01D53/68;B01D53/75;B01D53/86;C10K1/32;C10K1/34 |
主分类号 |
B01D53/52 |
| 代理机构 |
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代理人 |
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| 主权项 |
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| 地址 |
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