发明名称 SYSTEM AND METHOD FOR HOLOGRAPHIC FABRICATION AND REPLICATION OF DIFFRACTIVE OPTICAL ELEMENTS FOR MASKLESS LITHOGRAPHY
摘要 A method is disclosed for forming an array of focusing elements for use in a lithography system. In accordance with an embodiment, the method includes the steps of providing a master element that includes at least one diffractive pattern at a first location with respect to a target surface, illuminating the master element to produce a first diffractive pattern on the target surface at the first location, moving the master element with respect to the target surface to a second location with respect to the target surface, and illuminating the master element to produce a second diffractive pattern on the target surface at the second location.
申请公布号 WO2004031867(A3) 申请公布日期 2004.09.23
申请号 WO2003US31343 申请日期 2003.10.02
申请人 MASSACHUSETTS INSITUTE OF TECHNOLOGY 发明人 MENON, RAJESH;GIL, DARIO;CARTER, DAVID;BARBASTATHIS, GEORGE;SMITH, HENRY, I.
分类号 G03F1/00;G03F7/00;G03F7/075;G03F7/20;G03H1/00;G21G5/00 主分类号 G03F1/00
代理机构 代理人
主权项
地址