发明名称 |
SYSTEM AND METHOD FOR HOLOGRAPHIC FABRICATION AND REPLICATION OF DIFFRACTIVE OPTICAL ELEMENTS FOR MASKLESS LITHOGRAPHY |
摘要 |
A method is disclosed for forming an array of focusing elements for use in a lithography system. In accordance with an embodiment, the method includes the steps of providing a master element that includes at least one diffractive pattern at a first location with respect to a target surface, illuminating the master element to produce a first diffractive pattern on the target surface at the first location, moving the master element with respect to the target surface to a second location with respect to the target surface, and illuminating the master element to produce a second diffractive pattern on the target surface at the second location. |
申请公布号 |
WO2004031867(A3) |
申请公布日期 |
2004.09.23 |
申请号 |
WO2003US31343 |
申请日期 |
2003.10.02 |
申请人 |
MASSACHUSETTS INSITUTE OF TECHNOLOGY |
发明人 |
MENON, RAJESH;GIL, DARIO;CARTER, DAVID;BARBASTATHIS, GEORGE;SMITH, HENRY, I. |
分类号 |
G03F1/00;G03F7/00;G03F7/075;G03F7/20;G03H1/00;G21G5/00 |
主分类号 |
G03F1/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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