发明名称 EXTREME ULTRAVIOLET LIGHT GENERATING METHOD AND EXTREME ULTRAVIOLET LIGHT SOURCE DEVICE
摘要 <P>PROBLEM TO BE SOLVED: To realize a long pulse of EUV emission without giving a large heat load to an electrode like a conventional one and requiring a high precision control. <P>SOLUTION: A pulse current is supplied between a first and a second electrodes 2a, 2b installed inside a chamber 1 and a discharge channel is formed between the electrodes. Furthermore, laser beams L1 emitted from a laser source 7 are irradiated to a high temperature plasma material 8, and a low temperature plasma gas of an ion density of 10<SP>17</SP>-10<SP>20</SP>cm<SP>-3</SP>level is supplied to a narrow discharge channel formed between the electrodes 2a, 2b. Discharge acts on the low temperature plasma gas and the electron temperature increases to make a high temperature plasma and EUV emission is started. Since the low temperature plasma gas is continuously supplied to the discharge channel, a pinch effect or a confinement effect by a self magnetic field is carried out repeatedly and the EUV emission continues. This EUV emission is condensed by an EUV condenser 4 and is emitted from an EUV light extraction part 5. <P>COPYRIGHT: (C)2009,JPO&INPIT
申请公布号 JP2009087807(A) 申请公布日期 2009.04.23
申请号 JP20070257442 申请日期 2007.10.01
申请人 TOKYO INSTITUTE OF TECHNOLOGY;USHIO INC 发明人 HOSOGAI TOMONAO;HORIOKA KAZUHIKO;SEKI TADAHIRA;YOKOYAMA TAKUMA
分类号 H05G2/00;H01L21/027 主分类号 H05G2/00
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