| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a method of detecting contamination of a liquid containment system and/or a method of determining the time, at which the liquid containment system of an immersion lithography apparatus needs cleaning. <P>SOLUTION: A method of operating the liquid containment system of the immersion lithography apparatus is disclosed. Performances of the liquid containment system are measured by several different methods. On the basis of a result of the performance measurement, for example, a signal showing that it is required to take aid measure is generated. <P>COPYRIGHT: (C)2009,JPO&INPIT |
