发明名称 RESIST TRIMMING METHOD AND TRIMMING APPARATUS
摘要 <p>A resist trimming method includes a plasma generating step of generating plasma of a reaction gas; a removing step of removing ions and electrons from the generated plasma and selectively taking radicals; and a trimming step of trimming a resist pattern by irradiating the resist pattern with the plasma from which the ions and the electrons are removed.</p>
申请公布号 WO2010010706(A1) 申请公布日期 2010.01.28
申请号 WO2009JP03463 申请日期 2009.07.23
申请人 CANON ANELVA CORPORATION;MATSUI, NAOKO;KODAIRA, YOSHIMITSU;YOKOKAWA, NAOAKI 发明人 MATSUI, NAOKO;KODAIRA, YOSHIMITSU;YOKOKAWA, NAOAKI
分类号 H01L21/3065;G03F7/40;H01L21/027 主分类号 H01L21/3065
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