Radiation source, lithographic apparatus, and device manufacturing method

摘要

A radiation source (SO) is configured to generate extreme ultraviolet radiation (T). The radiation source includes a laser (30) constructed and arranged to generate a beam of radiation (32) directed to a plasma generation site (12,112) where a plasma is generated when the beam of radiation interacts with a fuel, an optical component (10,110,50) having a surface (11,56) that is arranged and positioned to be hit by a droplet (42) of fuel, and a temperature conditioner (54) constructed and arranged to elevate the temperature of the surface. A coating (52) may be provided on the surface that alters at least one property of the surface. An energy source (70) may be constructed and arranged (60,72) to prevent the droplet of fuel from solidifying or to evaporate the droplet of fuel before the droplet of fuel hits the surface.