PLASMA-CHEMICAL COATING APPARATUS

摘要

In a known plasma-chemical coating apparatus, a plasma chamber is provided within which at least one linear antenna is arranged for producing a plasma by means of electromagnetic power, in which a supply for a carrier gas terminates and which comprises a plasma exit opening in the direction of a treatment chamber for a plasma-assisted modification of a substrate. Starting from this, to achieve cleaning cycles as in coating apparatuses with comparatively slow coating processes, it is suggested according to the invention that the plasma exit opening is configured as an elongated narrowing and defined preferably on both sides by cylinders which extend in parallel with each other and are rotatable about their cylinder axis, and that a cleaning zone is respectively provided for each of the cylinders, into which an area of the outer surface of the respective cylinder which is to be cleaned can be introduced by rotation about the cylinder axis.

主权项

1. A plasma-chemical coating apparatus comprising:
a plasma chamber having at least one linear antenna arranged therein so as to produce a plasma by electromagnetic power, a carrier gas supply terminating in said plasma chamber and supplying a carrier gas thereto, and said plasma chamber having a plasma exit opening in a direction of a treatment chamber configured to provide a plasma-assisted modification of a substrate, wherein the plasma exit opening is a lengthwise-extending narrowing that is defined by at least one cylinder which is supported for rotation about a cylinder axis thereof, and wherein the apparatus has a cleaning zone into which an area of an outer surface of the cylinder is introduced by rotation about the cylinder axis and cleaned in said cleaning zone.