| 摘要 |
PROBLEM TO BE SOLVED: To perform precise exposure of a substrate.SOLUTION: A control device controls a drive system of a stage WST so that, a wafer relatively moves to a Y direction to plural detection regions, for detecting on, at least parts of detection areas of an alignment system (AL1, AL2-AL2), plural marks of the wafer W whose positions are different each other in the Y direction in a detection operation by the alignment system (AL1, AL2-AL2). In an exposure operation, the control device controls a drive system of a reticle stage and the drive system of the stage WST so as to compensate a measurement error (Abbe error) of an encoder system which occurs due to height difference (Abbe removal amount) of planes of respective scales to a reference plane of the stage WST, and so as to perform wafer alignment and scanning exposure of the wafer W on the basis of detection information of the alignment system.SELECTED DRAWING: Figure 3 |
