An imprint lithography process using a template (12) which includes a lower surface (566) with first recesses (562) having a first height (h1) and second recesses (564) having a second height (h2) greater than first height (h1) of first recesses, wherein curable liquid (40) is disposed in superimposition with the portions of template having recesses therein that are no greater than first height (h1) and is absent with respect to portions of template (12) having second height (h2).
申请公布号
EP1549475(A1)
申请公布日期
2005.07.06
申请号
EP20030788242
申请日期
2003.07.10
申请人
MOLECULAR IMPRINTS, INC.
发明人
SREENIVASAN, SIDLGATA;CHOI, BYUNG-JIN;WATTS, MICHAEL;SCHUMAKER, NORMAN;VOISIN, RONALD;MEISSL, MARIO;BONNECAZE, ROGER;WILLSON, GRANT