| 摘要 |
A negative blue-violet laser photosensitive composition that is highly sensitive to laser beams of blue-violet region, excelling in not only safe light properties under a yellow light but also the resolution and rectangularity of obtained image, which negative blue-violet laser photosensitive composition especially can appropriately be used as a dry film resist material and used in direct lithography by blue-violet laser beams. There are further provided, using the negative blue-violet laser photosensitive composition, an image forming material, image former and method of image formation. In particular, there is provided a negative blue-violet laser photosensitive composition wherein the minimum exposure intensity at which the exposure by blue-violet laser beams causes the residual film ratio to be 90% or higher is 40 mJ/cm2 or less and wherein with respect to a residual film ratio - exposure intensity curve obtained by plotting the residual film ratio at exposed part [t(%)] against the logarithm of exposure intensity by blue-violet laser beams [logE(mJ/cm2)], the gamma value of straight line binding point at a residual film ratio of 15% with point at a residual film ratio of 80%, t = gammalogE + delta, is 4.0x102 or more. There are further provided, using the negative blue-violet laser photosensitive composition, an image forming material, image former and method of image formation.
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