| 摘要 |
A computer-implemented method capable of evaluating a plasma-induced charging effect to a transistor in a plasma-based process for a dielectric layer performed above the transistor on which a metal layer is formed is provided. The method may include receiving parameters relating to the transistor, receiving parameters relating to an interconnection, receiving parameters relating to the plasma-based process, assigning first potentials to terminals of the transistor, calculating second potentials at the terminals of the transistor, and determining a degradation state of the transistor according to the second potentials at the terminals of the transistor. |
