发明名称 MOLD REMOVAL APPARATUS FOR NANO IMPRINT
摘要 The present invention relates to a demolding apparatus for nano-imprinting. The demolding apparatus comprises: a support table on which a material to be processed is mounted; a clamping unit installed at one side of the support table and grasping and fixing one end of the mold; a grasping means installed movably at one side of the support table and grasping the other end of the mold at one end thereof; a rotation means installed at one side of the support table and connected to one side of the grasping means at one side to rotate the grasping means at a predetermined angle; a conveying unit to which one side of the rotation means is coupled and which conveys the rotation means in one direction so that the grasping means moves together with the rotation means; and a supporting section installed at one side of the support table and moving in the same direction as the grasping means while supporting one side of the top surface of the mold, when the grasping means is conveyed in one direction. According to the present invention, the mold is demolded automatically after a material to be processed is patterned. In addition, the mold is demolded uniformly while it maintains a predetermined demolding angle. Thus, it is possible to significantly improve demolding workability and to significantly reduce defect generation caused by demolding during the processing.
申请公布号 KR20160095232(A) 申请公布日期 2016.08.11
申请号 KR20150015854 申请日期 2015.02.02
申请人 AND CORPORATION;SEMICOA CO., LTD. 发明人 BAEK, JEOM GON;CHO, MIN SU;CHEON, OK SOON
分类号 G03F7/00 主分类号 G03F7/00
代理机构 代理人
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