ADAPTIVELY PLASMA SOURCE HAVING IMPROVED CD UNIFORMITY, AND PLASMA CHAMBER USING THE SAME

摘要

An adaptive plasma source comprises: an inner plasma source which is arranged in an inner region and comprises an inner bushing and inner coils which are branched from the inner bushing and are spirally arranged along the circumference of the inner bushing; an outer plasma source which is arranged in an outer region and comprises an outer bushing and outer coils which are branched from the outer bushing and are spirally arranged along the circumference of the outer bushing; a first variable capacitor connected to an inner bushing; a second variable capacitor connected to an outer bushing; a matching box which is connected to the first variable capacitor and the second capacitor and controls the first variable capacitance of the first variable capacitor and the second variable capacitance of the second variable capacitor; and an RF power supply connected to the matching box. The present invention is designed to provide the adaptive plasma source capable of obtaining an improved CD uniformity by uniformly distributing a plasma density.