| 发明名称 |
LIQUID EJECTION HEAD AND METHOD OF PROCESSING SILICON SUBSTRATE |
| 摘要 |
Provided is a liquid ejection head, including: a substrate including a supply path passing through the substrate from a first surface of the substrate to a second surface thereof opposite to the first surface; and a member bonded to the second surface of the substrate via an adhesive, in which an inner wall of the supply path has a portion substantially in parallel with the second surface. |
| 申请公布号 |
US2016347064(A1) |
申请公布日期 |
2016.12.01 |
| 申请号 |
US201615138421 |
申请日期 |
2016.04.26 |
| 申请人 |
CANON KABUSHIKI KAISHA |
发明人 |
Kishimoto Keisuke;Yonemoto Taichi |
| 分类号 |
B41J2/16;H01L21/268;H01L21/311;H01L21/306;H01L21/308 |
主分类号 |
B41J2/16 |
| 代理机构 |
|
代理人 |
|
| 主权项 |
1. A liquid ejection head, comprising:
a substrate including a supply path passing through the substrate from a first surface of the substrate to a second surface thereof opposite to the first surface; and a member bonded to the second surface of the substrate via an adhesive, wherein an inner wall of the supply path has a portion substantially in parallel with the second surface. |
| 地址 |
Tokyo JP |
