发明名称 EIN LASERBEARBEITUNGSSYSTEM UND -VERFAHREN
摘要 <p>A substrate (16) is machined to form, for example, a via. The substrate is in a chamber (15) within which the gaseous environment is controlled. The machining laser beam (13) is delivered with control of parameters such as pulsing parameters to achieve desired effects. The gaseous environment may be controlled to control integral development of an insulating lining for a via, thereby avoiding the need for downstream etching and oxide growth steps. Also, machining may be performed in multiple passes in order to minimize thermal damage and to achieve other desired effects such as a particular via geometry.</p>
申请公布号 DE60210770(T2) 申请公布日期 2006.08.31
申请号 DE2002610770T 申请日期 2002.03.22
申请人 XSIL TECHNOLOGY LTD. 发明人 BOYLE, ADRIAN;MEIGHAN, OONAGH;WALSH, GILLIAN;MAH, KIA WOON
分类号 B23K26/00;B23K26/06;B23K26/12;B23K26/14;B23K26/38;B23K101/40;H01L21/302;H01L21/461;H05K3/00 主分类号 B23K26/00
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