SOLID-STATE IMAGING DEVICE AND METHOD OF MANUFACTURING SOLID-STATE IMAGING DEVICE

摘要

According to one embodiment, a solid-state imaging device includes photoelectric conversion elements, filters, and an absorption layer. The filters are each configured to transmit an electromagnetic wave having a predetermined wavelength and to reflect electromagnetic waves having other wavelengths. The filters have flat shapes inclined with respect to a substrate surface and are respectively disposed above the photoelectric conversion elements. The absorption layer is arranged at outer peripheries of arrangement regions of pixels, and at a position closer to a light-receiving face side than arrangement positions of the filters. The absorption layer is made of a material that absorbs electromagnetic waves reflected by the filters. The filters respectively have inclination angles with respect to the substrate surface, which are different from each other in accordance with the types of the pixels.

主权项

1. A solid-state imaging device including pixels of a plurality of types that are arranged in a two-dimensional state on a substrate and are configured to detect electromagnetic waves having different wavelengths respectively, the solid-state imaging device comprising:
photoelectric conversion elements arranged on the substrate respectively in arrangement regions of the pixels; filters each configured to transmit an electromagnetic wave having a predetermined wavelength and to reflect electromagnetic waves having other wavelengths, the filters having flat shapes inclined with respect to a substrate surface and respectively disposed above the photoelectric conversion elements, and an absorption layer arranged at outer peripheries of arrangement regions of the pixels, and at a position closer to a light-receiving face side than arrangement positions of the filters, wherein the absorption layer is made of a material that absorbs electromagnetic waves reflected by the filters, and the filters respectively have inclination angles with respect to the substrate surface, which are different from each other in accordance with the types of the pixels.