LINEAR DEPOSITION SOURCES FOR DEPOSITION PROCESSES
摘要
<p>Linear deposition sources are disclosed. In one embodiment, the linear deposition source includes a container accommodating evaporation material and a heater configured to generate heat energy such that vaporized material is discharged uniformly onto a substrate on which a deposition layer is formed. The heater is provided on the container, wherein a portion of the heater positioned at a center portion of the container in the longitudinal direction generates more heat energy than the other portion of the heater. The heater includes a coil configured in a sinusoidal pattern, wherein the curvature pitch or height of the portion of the coil positioned at the center portion of the container in the longitudinal direction is set to be different from that of the other portion of the coil. Further, the resistance of the portion of the coil positioned at the center portion of the container in the longitudinal direction may be set to be greater than that of the other portion of the coil.</p>
申请公布号
WO2008016247(A1)
申请公布日期
2008.02.07
申请号
WO2007KR03654
申请日期
2007.07.30
申请人
SOONCHUNHYANG UNIVERSITY INDUSTRY ACADEMY COOPERATION FOUNDATION;UM, TAI JOON;JOO, YOUNG CHEOL;LEE, SANG WOOK;KIM, KUG WEON
发明人
UM, TAI JOON;JOO, YOUNG CHEOL;LEE, SANG WOOK;KIM, KUG WEON