发明名称 |
Systems, Devices, and/or Methods for Deposition of Metallic and Ceramic Coatings |
摘要 |
Certain exemplary embodiments can provide a method, which can comprise depositing a substantially uniform coating on a substrate. The coating is deposited via a coating material stream that emanates from one or more vapor sources. The coating material stream is directed toward the substrate via a carrier gas in a chamber under vacuum. |
申请公布号 |
US2016168698(A1) |
申请公布日期 |
2016.06.16 |
申请号 |
US201514969083 |
申请日期 |
2015.12.15 |
申请人 |
Directed Vapor Technologies International, Inc. |
发明人 |
Hass Derek |
分类号 |
C23C16/44 |
主分类号 |
C23C16/44 |
代理机构 |
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代理人 |
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主权项 |
1. A system comprising:
a substrate; a coating material stream that emanates from one or more vapor sources, said coating material stream directed toward said substrate via a carrier gas in a coating chamber under vacuum, said carrier gas substantially surrounding said coating material stream as said substrate is exposed to a coating material comprised by said coating material stream, wherein:
said coating material stream moves relative to said substrate as said coating material is deposited on said substrate; andsaid coating material is deposited as a substantially uniform layer on said substrate via non-line of sight coating of at least a portion of said substrate. |
地址 |
Charlottesville VA US |