发明名称 Systems, Devices, and/or Methods for Deposition of Metallic and Ceramic Coatings
摘要 Certain exemplary embodiments can provide a method, which can comprise depositing a substantially uniform coating on a substrate. The coating is deposited via a coating material stream that emanates from one or more vapor sources. The coating material stream is directed toward the substrate via a carrier gas in a chamber under vacuum.
申请公布号 US2016168698(A1) 申请公布日期 2016.06.16
申请号 US201514969083 申请日期 2015.12.15
申请人 Directed Vapor Technologies International, Inc. 发明人 Hass Derek
分类号 C23C16/44 主分类号 C23C16/44
代理机构 代理人
主权项 1. A system comprising: a substrate; a coating material stream that emanates from one or more vapor sources, said coating material stream directed toward said substrate via a carrier gas in a coating chamber under vacuum, said carrier gas substantially surrounding said coating material stream as said substrate is exposed to a coating material comprised by said coating material stream, wherein: said coating material stream moves relative to said substrate as said coating material is deposited on said substrate; andsaid coating material is deposited as a substantially uniform layer on said substrate via non-line of sight coating of at least a portion of said substrate.
地址 Charlottesville VA US