| 摘要 |
PROBLEM TO BE SOLVED: To inhibit entry of ambient air into a space between an opposite member and a substrate.SOLUTION: A substrate processing apparatus comprises: a top plate 51 held by an opposite member holding part at a first position, and held by a substrate holding part 31 and rotated together with the substrate holding part 31 at a second position; a gas supply part for supplying a gas to a processing space 90 between the top plate 51 and a substrate 9, and supplying a gas to a clearance 518 between an inside face of a held part 512 of the top plate 51 and an outside face of a first process liquid nozzle 411 located inside the held part 512. Accordingly, the clearance 518 between the top plate 51 rotated together with the substrate 9 and the first process liquid nozzle 411 in a rest state can be sealed by the gas. This can inhibit entry of ambient air from the clearance 518 between the top plate 51 and the first process liquid nozzle 411 to the processing space 90.SELECTED DRAWING: Figure 10 |
