ENTWINED MANIFOLDS FOR VAPOR DEPOSITION AND FLUID MIXING

摘要

Entwined manifolds enable simultaneous but separate vapor deposition of different materials in interspersed patterns on a target substrate. A multi-manifold structure comprising a plurality of entwined manifolds is described. Methods of manufacture and methods of use are also described. The multi-manifold is suitable for PVD applications, including vapor deposition of emissive pixel materials for multi-color displays. Multi- manifolds are also suitable for CVD applications and for fluid mixing.