发明名称 |
Chemically-Sensitive Field Effect Transistor |
摘要 |
A chemically-sensitive field effect transistor is disclosed herein. The chemically-sensitive field effect transistor comprises a CMOS structure comprising a conductive source and a conductive drain, a channel and an analyte-sensitive dielectric layer. The channel extends from the conductive source to the conductive drain. The channel is composed of a one-dimensional transistor material or a two-dimensional transistor material. The analyte-sensitive dielectric layer is disposed over the channel. An I-V curve or an I-Vg curve is shifted in response to a chemical reaction occurring on or near the chemically-sensitive field effect transistor. |
申请公布号 |
US2016178569(A1) |
申请公布日期 |
2016.06.23 |
申请号 |
US201514963253 |
申请日期 |
2015.12.09 |
申请人 |
Edico Genome Corporation |
发明人 |
Hoffman Paul;Lerner Mitchell;Van Rooyen Pieter |
分类号 |
G01N27/414;H01L29/24;H01L29/16 |
主分类号 |
G01N27/414 |
代理机构 |
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代理人 |
|
主权项 |
1. A chemically-sensitive field effect transistor comprising:
an integrated circuit structure comprising a conductive source and a conductive drain; a channel extending from the conductive source to the conductive drain, the channel composed of a one-dimensional transistor material or a two-dimensional transistor material; an oxide layer disposed over the channel; wherein an I-V curve or an I-Vg curve is shifted in response to a chemical reaction occurring over or near the chemically-sensitive field effect transistor. |
地址 |
La Jolla CA US |