发明名称 SEMICONDUCTOR PROCESS CHAMBER
摘要 <p>A process kit for a semiconductor process chamber is provided herein. In one embodiment, a process kit for a semiconductor processing chamber, includes one or more components fabricated from a metal-free sintered silicon carbide material. The process kit comprises at least one of a substrate support, a pre-heat ring, lift pins, and substrate support pins. In another embodiment, a semiconductor process chamber is provided, having a chamber body and a substrate support disposed in the chamber body. The substrate support is fabricated from metal-free sintered silicon carbide. Optionally, the process chamber may include a process kit having at least one component fabricated from a metal-free sintered silicon carbide.</p>
申请公布号 WO2007050309(A1) 申请公布日期 2007.05.03
申请号 WO2006US39914 申请日期 2006.10.12
申请人 APPLIED MATERIALS, INC.;METZNER, CRAIG;HANSSON, PER-OVE 发明人 METZNER, CRAIG;HANSSON, PER-OVE
分类号 B05C13/00;B05C21/00 主分类号 B05C13/00
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