发明名称 POROUS ORGANOSILICATE LAYERS, AND VAPOR DEPOSITION SYSTEMS AND METHODS FOR PREPARING SAME
摘要 The present invention provides porous organosilicate layers, and vapor deposition systems and methods for preparing such layers on substrates. The porous organosilicate layers are useful, for example, as masks.
申请公布号 US2008318440(A1) 申请公布日期 2008.12.25
申请号 US20080200229 申请日期 2008.08.28
申请人 MICRON TECHNOLOGY, INC. 发明人 MARSH EUGENE P.
分类号 H01L21/312;B05D3/06;B32B3/26;C23C16/00 主分类号 H01L21/312
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