MASKING SYSTEMS AND METHODS

摘要

Embodiments provide systems, methods, and masking workstations for masking a planar substrate with a shield. The shield is configured to facilitate the removal of a waste portion of masking material from a portion of a planar substrate. In some cases the shield is placed adjacent to a substrate and a masking material is applied to the substrate and at least a portion of the shield. A waste portion is separated from the masking material and the shield removes the waste portion. Embodiments can be useful for masking only a portion of a planar substrate, including glass panes and glass units, for example.

主权项

1. A method of masking a planar substrate, comprising:
locating a planar substrate with respect to a support surface, the planar substrate comprising a substrate surface; placing a shield over a first portion of the support surface; applying a masking material to the substrate surface and to the shield; separating a waste portion of the masking material from a retained portion of the masking material; and moving the shield and the waste portion away from the planar substrate.