| 发明名称 |
TEST PATTERN DRAWING METHOD FOR EXTRACTING OPC MODEL |
| 摘要 |
<p>A test pattern forming method is provided to improve reliability of a simulation result by forming a reticle using CD(Critical Dimension) difference data. An OPC modeling data extracting test pattern is composed of a first portion and a second portion. The first portion includes a test pattern with a variety of lines and intervals. The second portion is formed at a periphery of the test pattern of the first portion. The second portion has a variety of pattern densities. The second portion is formed within 500 mum range of the test pattern.</p> |
| 申请公布号 |
KR100662961(B1) |
申请公布日期 |
2006.12.21 |
| 申请号 |
KR20050124906 |
申请日期 |
2005.12.17 |
| 申请人 |
DONGBU ELECTRONICS CO., LTD. |
发明人 |
CHOI, JAE YOUNG |
| 分类号 |
H01L21/027 |
主分类号 |
H01L21/027 |
| 代理机构 |
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